Micro/Nano fabrication facility
Electron Beam Lithography:
SEM (Hitachi S3400N) + Nabity NPGS 50nm resolution
Raith Voyager: 50KeV, 8nm linewidth
SEM (Hitachi S3400N) + Nabity NPGS 50nm resolution
Raith Voyager: 50KeV, 8nm linewidth
Photolithography Mask Aligner: SUSS MJB4
Thin Film Deposition: Thermal+Sputter evaporator AJA international, Angstrom Nexdep and Temescal/Airco FC-1800 e-beam evaporator
Wire bonder: Westbond 7476E Wedge-Wedge
Imaging and spectroscopy facility
Scanning electron microscope (field emission) with EDS functions: Hitachi 4800
Electron transmission microscope with EDS functions: FEI TITAN 300kV
Micro-Raman microscope: custom build with tripple grating and liquid helium temperature capabilities
Ion Milling System: AJA international
Atomic force microscope: Bruker multimode
Electrical and magnetic characterization facility
Physical Properties Measurement System (PPMS-EverCool II, 9T magnetic field).
Montana Instrument Cryostation (with Raman spectroscopy)
Montana Instrument Cryostation (with Raman spectroscopy)
Crystal growth and characterization facility
Vapor phase transport growth systems (Dualzone tube furnaces)
Flux growth systems (Muffle furnaces)
Chamical vapor deposition system (plasma enhanced)
Flux growth systems (Muffle furnaces)
Chamical vapor deposition system (plasma enhanced)
X-ray diffractometer: Bruker Powder XRD